The world-leading research centre Imec has announced the arrival of the ASML EXE:5200 High NA EUV lithography system. This machine is currently the most advanced tool for making chips. Its installation in Leuven, Belgium, marks a major step towards the next generation of smaller and more powerful semiconductors.
By using this technology, Imec and its global partners will be able to design the chips of the future. These include sub-2nm logic and high-density memory, which are essential for the growth of advanced artificial intelligence and high-performance computing.
For the past two years, ASML and Imec have worked together at a joint laboratory in Veldhoven, the Netherlands. Moving this technology to the 300mm cleanroom in Leuven allows the industry to test these methods on a larger scale. The new machine offers better resolution and faster production speeds, which will help companies develop new technologies more quickly.
Luc Van den Hove, the CEO of IMEC, stated that high-NA EUV will be a cornerstone capability as the industry enters a new era of ultra-small chip scaling. He noted that the project is part of a five-year strategic partnership supported by the European Union, as well as the Dutch and Flemish governments. He added that the tool will help strengthen Europe’s position as a leader in semiconductor research.
Christophe Fouquet, the CEO of ASML, described the installation as an important step forward. He said the two organisations are working together to accelerate the development of advanced memory and computing technologies.
The machine is expected to be fully ready for use by the end of 2026. Until then, the existing laboratory in Veldhoven will continue to operate to ensure research and development can proceed without interruption.
NEWS BRAINPORT
